Teva Prices Upsized Sustainability-Linked Senior Notes The company also raised its full-year guidance. Separately, the company reported 63% year-over-year increase in third-quarter sales to $1.037 billion and non-GAAP EPS of $1.75, up from $1.74 a year ago. Aaron Cox, who was named executive vice president, finance, will succeed Hoelscher. Horizon Therapeutics plc (NASDAQ: HZNP) announced Paul Hoelscher, executive vice president, chief financial officer, will retire effective May 16, 2022, and continue as an advisor to the company through May 2023. Stocks In Focus Horizon Announces Retirement Of CFO, Beat-and-raise Q3
Other features, aspects, and objects of the invention can be obtained from a review of the specification, the figures, and the claims.Here's a roundup of top developments in the biotech space over the last 24 hours. This description is not intended to be a complete description of, or limit the scope of, the invention. The flame torch can be used to shape, polish, etch, planarize, deposit, chemically modify and/or redistribute material on the surface of the object. The torch can also be used to modify the surface after cleaning, without transferring the object or engaging in any intermediate processing, by supplying a second reactive precursor that reacts with the surface itself. Reactive atom plasma processing can be used to clean the surface of a contaminant that chemically combines with the atomic radicals of the precursor without affecting the surface. The discharge provides a stable and predictable distribution of reactive species permitting the generation of a predetermined surface by translating the plasma across the workpiece along a calculated path.Ībstract: A flame torch can be used to clean the surface of a contact-sensitive object, such as a glass optic, extremely thin workpiece, or semiconductor wafer by providing a reactive precursor gas to the feed gases of the torch. The products of the reaction are gas phase compounds that flow from the surface of the workpiece, exposing fresh material to the etchant without condensation and redeposition on the newly created surface. In this example, these reactive species are produced by a noble gas plasma from trace constituent fluorocarbons or other fluorine containing gases added to the host argon matrix. In one example, workpiece material is removed at the atomic level through reaction with fluorine atoms. The apparatus and methods use an atmospheric pressure mixed gas plasma discharge as a sub-aperture polisher of, for example, fused silica and single crystal silicon, silicon carbide and other materials.
Abstract: Fabrication apparatus and methods are disclosed for shaping and finishing difficult materials with no subsurface damage.
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